| Home  | About ScienceAsia  | Publication charge  | Advertise with us  | Subscription for printed version  | Contact us  
Editorial Board
Journal Policy
Instructions for Authors
Online submission
Author Login
Reviewer Login
Volume 50 Number 1
Volume 49 Number 6
Volume 49 Number 5
Volume 49S Number 1
Volume 49 Number 4
Volume 49 Number 3
Earlier issues
Back

Research Article

ScienceAsia 25 (1999) : 057-063 |doi: 10.2306/scienceasia1513-1874.1999.25.057

 

Removal of Trimethylamine and Ammonia Using Electron Attachment Reaction

Wiwut Tanthapanichakoona, Paisarn Khongprasarnkalna, Tawatchai Charinpanitkula, Hajime Tamonb, Noriaki Sanoc and Morio Okazakid


ABSTRACT: Experimental investigation on the application of electron attachment reaction to the removal of dilute gaseous pollutants has been carried out using a corona-discharge reactor. The effects of several factors, namely, discharge current and coexisting O2 or H2 O vapor on individual removal efficiency of two kinds of gaseous pollutants, namely, trimethylamine ((CH3)3N) and ammonia (NH3) have been investigated. The role of ozonation reaction is next investigated using two reactors in series. In addition, a two-reactor system is proposed and shown to remove both (CH3)3N and SO2 with less by-products. The experimental results reveal that generally the higher the discharge current, the higher the removal efficiency. It is found that the presence of O2 enhances the removal efficiency of both impurity gases. On the other hand, the presence of water vapor enhances the removal efficiency of (CH3)3N but retards that of NH3.

Download PDF


School of Energy and Materials, King Mongkut's University of Technology Thonburi, Suksawat 48 Road, Bangkok 10140, Thailand.
a Department of Chemical Engineering, Chulalongkorn University, Patumwan, Bangkok 10330, Thailand.
b Department of Chemical Engineering, Kyoto University, Sakyo-ku, Kyoto 606-8501, Japan.
c Department of Chemical Engineering, Himeji Institute of Technology, Himeji 671-2201. Japan.
d Kyoto Polytechnic College, Maizuru, Kyoto 624, Japan.

Received 25 Feb 1999